부산대학교 공동실험실습관
미래를 향한 힘찬 발걸음
부산대학교 공동실험실습관
미래를 향한 힘찬 발걸음
공유
인쇄
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| 모델명 | AXIS SUPRA |
| 설치장소 | 물성분석실 (209) |
| 설치상태 | 고정 |
| 장비상태 | 양호 |
| 문의처 | TEL : 051-510-3422 E-mail : mymy32101@naver.com |
| 오퍼레이터 | 이진현 |
예약정보
예약가능요일 : 월요일, 화요일, 수요일, 목요일, 금요일,
예약최소/최대시간/(예약단위당)예약가능건수 : 1일 / 5일 / 1건
예약가능기간 : 현재일로부터 2개월까지
제약사항 : 당일예약불가, 당일취소불가
유의사항
"담당자와 통화 후 의뢰신청해주시기 바랍니다."
1. Normal XPS 실험: 시료를 로딩하는 홀더의 사이즈가 제한적이므로, 시료의 사이즈는 너비 1 cm * 1 cm, 높이 5 mm 이하가 적당합니다. '최대' 너비 2 cm * 2 cm, 높이 5 mm를 넘지 않는 것이 좋습니다(벌크 혹은 박막 시료 기준).
2. Powder 시료 실험: 진공 중에서 측정하므로 완전히 dry된 상태의 시료만 측정 가능합니다. 시료는 slide glass에 carbon tape로 붙여서 받고 있습니다(Slide glass와 carbon tape가 없으시면 내선 3422로 문의하시기 바랍니다.).
3. Depth profile 실험: 물질마다 etching 되는 정도가 다르므로, 사전 test를 위해 측정 시료가 최소 1 cm * 1cm 정도보다 커야 합니다.
4. UPS 실험: 표면 저항이 큰 시료에서는 측정이 잘 되지 않습니다. (~ 수 Mohm)
1. Normal XPS 실험: 시료를 로딩하는 홀더의 사이즈가 제한적이므로, 시료의 사이즈는 너비 1 cm * 1 cm, 높이 5 mm 이하가 적당합니다. '최대' 너비 2 cm * 2 cm, 높이 5 mm를 넘지 않는 것이 좋습니다(벌크 혹은 박막 시료 기준).
2. Powder 시료 실험: 진공 중에서 측정하므로 완전히 dry된 상태의 시료만 측정 가능합니다. 시료는 slide glass에 carbon tape로 붙여서 받고 있습니다(Slide glass와 carbon tape가 없으시면 내선 3422로 문의하시기 바랍니다.).
3. Depth profile 실험: 물질마다 etching 되는 정도가 다르므로, 사전 test를 위해 측정 시료가 최소 1 cm * 1cm 정도보다 커야 합니다.
4. UPS 실험: 표면 저항이 큰 시료에서는 측정이 잘 되지 않습니다. (~ 수 Mohm)
| 1. XPS
Al-Ka source (1486.6 eV)로부터 생성된 에너지를 가지는 X-선을 시료 표면에 조사하면, 광전효과(Photoelectric effect)에 의해 시료 내부 원자의 core level 에서 전자가 방출된다. 이 때, 방출되는 전자의 운동에너지를 측정함으로써 시료 표면으로부터 약 10 nm 이내에 존재하는 원소의 종류와 원소의 조성비 (elemental composition) 그리고 각 원소의 화학결합상태 (chemical state) 분석이 가능하다. 2. UPS He source (10~20 eV)로부터 생성된, 극자외선 영역의 빛을 사용하면, 시료의 가전자(valence electron) 영역의 전자가 방출된다. 이때, 방출된 전자의 운동 에너지를 측정함으로써, 시료 표면의 일함수 (work-function) 분석 및 가전자띠(valence band) 분석이 가능하다. |
| 1. 장비의 구성 (Configurations of Goods)
(1) 주장비 - Vacuum system - Electron energy analyser - Automated monochromatic X-ray source - Sample alignment system - Sample manipulator and platen - Gas cluster ion source - Pumping kit - Data system - UPS (Ultraviolet Photoelectron Spectroscopy) - ISS (Ion Scattering Spectra) - Water pressure boost pump - Heating and cooling in analysis chamber and load lock chamber (2) 부속 장비 - Water chiller and recirculator - UPS (Uninterrupted Power Supply) 2. 성능 및 규격 (Performance and Specificpation) (1) Vacuum System - The sample analysis chamber is a multiport Ultra-high vacuum chamber of mu-metal construction. - The chamber would be thermally insulated using a permanently fitted baking jacket. Bakeout times are set using a 24 hour / 7 day timer with thermostatically controlled baking bands to ensure that the spectrometer is baked at average temperature of 120℃. - The use of cables rated to higher temperatures means that there would be no need remove any cables and cameras before baking. (2) Electron energy analyser - Bigger than 165 mm mean radius concentric hemispherical analyser for spectroscopy and hemispherical analyser or spherical mirror analyser for imaging. - Better than 128 channel delay line detector (DLD) would be used for both spectroscopy and parallel imaging modes. - In spectroscopy mode would have greater than 100 discrete data channels improving the sensitivity in spectroscopy mode. - X-ray photoelectron spectroscopy Ultimate energy resolution : <0.48eV * Resolution is defined as the full width at half maximum (FWHM) of the Ag3d5/2 peak measured after removal of a linearly inter polated background - X-ray photoelectron imaging Lateral resolution of the parallel imaging is ≤3㎛ (3) Automated monochromatic X-ray source - Bigger than 500 mm Rowland circle geometry, controlled by data system. - Auto arrangement provides easy control, optimisation and calibration of the mirror position and ensures that the X-ray illuminated area is correctly aligned with the analysis position. (4) Sample alignment system - Camera gives a global view of each sample holder such that analysis positions can be viewed, indexed and pre-programmed ready for data acquisition. - High magnification sample analysis chamber microscope has a motorized, more than 12 x optical zoom controlled from the data-system facilitating remote operation of the camera. - The optical images are captured within the Data Acquisition software and would be saved and manipulated in the Data Processing software. (5) Sample manipulator and platen - Automated five axis X,Y,Z,?,Φ precision manipulator system (X-axis) more than ± 25 mm (Y-axis) more than ± 15 mm (Z-axis) more than ± 12 mm (θ-rotation) more than ± 90° (Φ-rotation) more than ± 180° - The sample manipulator would have standard reference materials (Au, Ag and Cu) for spectroscopic calibration as well as an Au grid for imaging calibration permanently mounted. - sample holder would be loaded onto the auto-stage by an automated sequence and exchanged automatically. Dual height sample holder : up to 15mm Combination sample holder : This holder combines a flat sample mounting Z-rotation sample holder: Primarily for use in depth profiling experiments. - up to three sample holders could be loaded onto the auto-exchange magazine. - Sample manipulator has standard reference materials(Au, Ag, Cu and gold grid) (6) Gas cluster ion source - Monatomic Ar+ ion mode : 500eV ~ 4keV or higher - Arn+ cluster ion mode : 500eV ~ 8keV or higher, cluster size 250 ~ 2000 or higher - Double filament - The ion source would be fully integrated with the data acquisition system. Switching between monatomic Ar and Ar cluster modes would be a simple operation controlled via the data-system. (7) Pumping kit - The sample analysis chamber : turbo molecular pump, Ti sublimation pump Base pressure in the analysis chamber is < 5x10 -10 torr - The load lock chamber : turbo molecular pump directly, oil free, dry scroll pump. Base pressure in the analysis chamber is < 5x10-9 torr (8) Data system - The data acquisition and Processing software would run on a PC platform with MS Windows operating system. (9) UPS (Ultraviolet Photoelectron Spectroscopy) - Windowless discharge lamp of fully bakeable metal and ceramic construction - Optimised for maximum He (I) or He (II) (or Ne (l)/Ne (ll)) output. - Double differential pump : by the sample analysis chamber scroll backing pump and load lock chamber TMP - Differential pumping and gas introduction is controlled through the UPS work flow in the data acquisition system and is fully interlocked to ensure vacuum is correctly maintained. - The introduction and pressure of He gas would be regulated by a piezoelectric valve allowing automatic control of the gas pressure for optimum He (I) or He (II) photon production. - The minimum step size is 1 meV . - Performance on clean, polycrystalline silver using He I radiation. Sensitivity is defined as the counts per second (cps) of the Ag 4d peak. Resolution is defined by the 80-20%measurement of the Ag Fermi edge excited by He I radiation. Sensitivity : ≥1,000,000 cps @ 120 meV resolution He I : He II ratio : 4 : 1 or better (10) ISS (Ion Scattering Spectra) - Ion scattering spectroscopy using Ar+ or He+ ions. - Performance on pure Au scattering 1 kV He+ ions using the installed ion source. Sensitivity is defined as counts per second per nA of ion current at the Au peak energy. Energy resolution is defined as the FWHM. Sensitivity : ≥12,000 cps/nA@12eV FWHM (11) Water chiller and recirculator - A cooled re-circulating water supply for use with main system. - Provides coolant water for the entire instrument including X-ray monochromator, magnetic lens and water cooled turbomolecular pumps. - The water circuit of the main instrument is fitted with a de-ionising system to maintain low conductivity in the cooling water. Safety interlocks on all main water supplies are designed to prevent instrument damage. (12) Water pressure boost pump - Increases the cooling water flow rate through the Al anode during X-ray production. (13) Heating and cooling in analysis chamber and load lock chamber - Temperature range : +800℃ ~ -100℃ - A heat &cool sample holder with on board heater and thermocouple - PID controller - Cabling, piping and liquid nitrogen Dewer (14) UPS (Uninterrupted Power Supply) for vacuum - Backup time of 30 mintues at 220V AC 10KVA or better |
| X-ray photoelectron spectroscopy (XPS) is a mature and widely used surface analysis technique for materials(Co & Mn doped Pd compounds, Sr & Ru thin film, nano materials etc.) characterisation. |
| 1. 담당자와 통화 (051-510-3422)
2. 홈페이지를 통해 이용신청 |
| * Normal spectrum
- 120,000원/시료 (1시간, 원소 5개 기준) * Depth profile - 240,000원/시료 (2시간, Ar+ sputtering, 원소 3개 기준) - 480,000원/시료 (2시간, Ar+ cluster sputtering, 원소 3개 기준) * Angle resolved XPS - 240,000원/시료 (2시간, 원소 3개 기준) * Temperature dependence - 240,000원/시료 (2시간, 원소 3개 기준) * UPS - 240,000원/시료 (1시간 기준) * ISS - 240,000원/시료 (1시간 기준) <분석시 추가 사항> * Surface etching - 50,000원/회 (Ar+/Ar+ cluster sputtering) <원소 추가 분석시> * Normal spectrum - 10,000원/원소 * Depth profile - 50,000원/원소 <시간 추가 분석시> - 60,000원/시간 ** <수가 책정 기준> 교내 60%, 외부기관 및 일반사용자 100% ** |
X-선 광전자 분광분석기.pdf
(1MB)